Panasonic develops new nanoe™ X that halves mold inhibition time compared with the previous model

Tokyo, Japan, September 28, 2026 – Panasonic Corporation (Panasonic) today announced that it has developed a new nanoe™ X generating device. In addition to increasing the amount of OH radicals—which inhibit bacteria and viruses and provide deodorization—to 72 trillion per second, 150 times^*1 the 480 billion per second generated by nanoe™, Panasonic has also increased the components that contribute to mold inhibition.^*2 As a result, mold inhibition time has been reduced by half^*3 compared with nanoe™ X (Previous Generation), which previously offered the highest OH radical generation level.

In recent years, rising temperatures, increasing humidity, and more frequent heavy rainfall associated with climate change have heightened the need for measures to address mold in homes and other buildings. Moreover, while the growing adoption of highly insulated and airtight homes designed for greater energy efficiency has enhanced indoor comfort, it has also increased the need for measures against condensation and mold caused by insufficient ventilation and moisture retention in airtight rooms.^*4 Mold is recognized as a concern that not only causes deterioration of buildings and furniture but also affects indoor air quality, making effective countermeasures increasingly important.

For more than 20 years, Panasonic has pursued research and development of nanoe™ X technology, focusing on increasing the amount of OH radicals that provide bacteria and virus inhibition and deodorization benefits. In addition, exploring other effective components to further improve mold inhibition performance has been an important area of research. The newly developed nanoe™ X not only increases OH radical generation but also enhances mold-inhibiting components,^*2 reducing mold inhibition time by half^*3 compared with previous technology.

Previously, mold inhibition by nanoe™ X technology was believed to result from damage to the cell membrane structure of mold. Analysis of the inhibition mechanism of nanoe™ X newly confirmed that, in addition to increasing the rate of damage to mold cell membranes, mold-inhibiting components also denature proteins involved in mold metabolism and reproduction. This suggests that nanoe™ X more effectively impairs the vital functions of mold.
These effects are believed to work synergistically, resulting in higher mold inhibition performance than previously achieved.

Panasonic will continue advancing nanoe™ X technology to help improve air quality and address mold-related issues in a wide range of environments, including living, mobility, and public spaces, contributing to cleaner and more comfortable spaces.

OH radical generation has been increased to 150 times^*1 that of nanoe™, while the number of effective components contributing to mold inhibition has also been increased.^*2 Compared with conventional nanoe™ X (Previous Generation), mold inhibition time has been reduced by half.^*3

*These verification results were obtained in a test space equivalent to approximately 24 m³.

The analysis confirmed that newly developed nanoe™ X:
(1) Increases the rate of damage to mold cell membranes
(2) Denatures internal proteins involved in mold metabolism and reproduction by mold-inhibiting components.
These findings suggest that the vital functions of mold are impaired more effectively than with conventional technology. These combined effects are believed to work synergistically to deliver superior mold inhibition performance.
Furthermore, a mechanism was suggested in which damage to mold cell membranes allows mold-inhibiting components to penetrate the cells and denature proteins involved in mold metabolism and reproduction, thereby inhibiting mold.

*These verification results were obtained in a test chamber of approximately 45 liters.

The evolution of nanoe™ X technology can be described as the evolution of OH radical generation methods. Historically, development efforts have focused on the generation area to efficiently produce larger quantities of OH radicals. Concentration levels have been increased by expanding the generation area spatially from points to lines and then to planes. In the newly developed nanoe™ X, Panasonic retained the round-leader discharge system adopted in nanoe™ X (Previous Generation) while increasing the number of discharges. This expands the OH radical generation area over time as well as space, achieving even higher concentrations. Furthermore, during the process of collecting airborne moisture at the electrode tip and applying discharge, Panasonic increased the amount of condensed moisture and extended the duration of high-voltage application. This promotes chemical reactions at the electrode tip and increases the amount of effective components that contribute to mold inhibition.

*1 OH radical generation: 72 trillion per second for newly developed nanoe™ X versus 480 billion per second for nanoe™ X (Previous Generation).
OH radical levels were measured immediately downstream of the generating device using the ESR method (Panasonic data).
*2 Confirmed that the quantity of NO radicals, a component that contributes to mold inhibition, is greater than that of previous generation nanoe™ X.
NO radical levels were measured immediately downstream of the generating device using the ESR method (Panasonic data).
*3 The time required to inhibit surface-adhering mold was reduced by half compared with nanoe™ X (Previous Genaration). Verification results obtained in a test space equivalent to approximately 24 m³.
*4 Report of the Study Group on Comfortable and Healthy Housing: Toward the Realization of Comfortable and Healthy Living Environments (Ministry of Health, Labour and Welfare,)
https://www.mhlw.go.jp/www1/shingi/s9808/s0805-1.html
*5 Verification results obtained in a test space equivalent to approximately 24 m³.
*6 "nanoe," "ナノイー," "nanoeX," and their logomarks are trademarks of Panasonic Holdings Corporation. (About nanoe™ X: https://panasonic.jp/nanoe/summary.html)

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